ISHIKAWA Yasuaki
Department Aoyama Gakuin University Department of Electrical Engineering and Electronics, College of Science and Engineering Position Professor |
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Language | English |
Publication Date | 2018/10 |
Type | Academic Journal |
Peer Review | Peer reviewed |
Title | Influence of ALD Precursors and High-Pressure Water Vapor Annealing on Al2O3/GaN MOS Capacitor Characteristics |
Contribution Type | Collaboration |
Journal | AIP Adv. |
Journal Type | Another Country |
Volume, Issue, Page | 8,pp.105103-1-6 |
Author and coauthor | Mutsunori Uenuma, Kiyoshi Takahashi, Sho Sonehara, Yuta Tominaga, Yuta Fujimoto, Yasuaki Ishikawa, and Yukiharu Uraoka |
DOI | 10.1063/1.5041501 |